zhonghangjiayue

Product Performance Maximum temperature：1600℃ Reaction zone size：Φ650*650*2000mm Filling pressure：≤0.05MPa Cold ultimate vacuum： ≤100Pa Description of High Temperature Horizontal Carbonisation Equipment This equipment is a high-temperature intelligent horizontal carbonization furnace , which is mainly used for PI film carbonisation treatment. If you want to know more types of heat treating equipment , please visit our website.

Model: JYRH1-1RD Product Performance Equipment specification 1400℃-400*400*400mm Total Power 12KW Effective working area 400*400*400mm Description of Debinding Furnace This debinding furnace uses Cornell resistance wire as the heating element and features an intelligent temperature control system, silicon control, and high-precision temperature control. The debinding and sintering furnace chamber uses foam ceramics. The double-layer debinding furnace shell is equipped with an air-cooling system, to effectively ensure the surface temperature of the shell. If you want to know more heat treatment furnace types , please visit our website.

Ceramic Sintering Furnace Specialised equipment for ceramic crystals from CHJT INTELLIGENT is dedicated to providing efficient and accurate solutions for processing ceramic materials. Our state-of-the-art ceramic box sintering resistance furnace covers high-temperature firing, molding and casting processes for the production of electronic components and other high-performance ceramic products. We ensure that our ceramic sintering furnace excels in temperature control and efficiency, helping our customers to stand out in a competitive market environment. Application of Ceramic Sintering Furnace Optoelectronic material growth equipment is mainly used in the field of optical functional materials, such as optoelectronic crystals, ceramics, glass and semiconductors, and other optoelectronic material preparation, processing, heat treatment, and other processes. The products in the field of optoelectronic materials are mainly for the sintering and heat treatment process of CdTe and GaO cr...

Graphite Furnace Product Performance Maximum temperature: 3000℃ Size of reaction area: Φ650×650×2000mm Pressure rise rate：≤0.05MPa Cold ultimate vacuum ：≤100Pa Description of Carbon Material High Temperature Graphitization Equipment This equipment is a high-temperature intelligent horizontal graphite equipment, which is mainly used for the graphitization of graphene heat dissipation film and PI film. Now the price of graphitization furnace is reasonable, anything you need, please contact us. If you want to know more types of vacuum heat treat furnace , please visit our website.